Research Facilities
within our laboratory
Characterization
Fabrication
Computation
- Femtosecond Amplifier (4 mJ/pulse) with 45 fs pulse width, Optical Parametric Amplifier and Second/Third Harmonic Generator.
- Static magneto-optical Kerr effect magnetometer (Static MOKE).
- Time-and space resolved magneto-optical Kerr effect (TR-MOKE) microscope with better than 80 fs temporal and 700 nm spatial resolutions.
- Broadband ferromagnetic resonance (FMR) spectrometer using a 50 GHz Vector Network Analyzer and a high frequency probe station.
- Dielectric Relaxation Spectroscopy Setup (10 MHz to 50 GHz).
- Microfocused and Conventional Brillouin light scattering (BLS) setup.
- Terahertz time-domain spectroscopy setup (jointly with Dr. Rajib Mitra).
- Optical and electronic components and detectors for setting up new experiments.
Fabrication
- DC and RF sputtering unit with 10^-9 Torr vaccum chamber.
- Electrodeposition setup.
- Synthetic lab for preparation of various nanoparticles by chemical route.
Computation
- Several high performance PC and workstations are used for following simulation works.
- Micromagnetic simulations by using OOMMF, NMAG, LLGMICRO (commercial) license.
- Self built codes for micromagnetic simulations and calculation of magnonic dispersion relations.
- Self-built code on plane wave method.
- Three and four temperature modelling.
- Monte Carlo simulations (jointly with Dr. Saswati Barman).
- Thermal conduction in solid (jointly with Dr. Saswati Barman).
institute facilities
- Environmental scanning electron microscope with EDX spectroscopy (ESEM).
- Field emission scanning electron microscope (FESEM).
- High resolution transmission electron microscope with EDX and EELS.
- Atomic and magnetic force microscopes (AFM & MFM).
- X-ray diffraction, reflectivity and rocking curve analysis.
- Mini X-ray diffraction (Mini XRD).
- Differential scanning calorimeter (DSC).
- Spectroscopic ellipsometry.
- Thermogravimetric and differential thermal analysis (TG-DTA).
- Vibrating sample magnetometer (VSM).
- Pulsed laser deposition with Excimer laser (ArF, KrF).
- Dual beam focused ion beam lithography.
- Class 10000 (with small class 1000 spaces) clean room.